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Thin Film / Nano Structure Preparation and Processing

Spin coater Spin coater Mikasa 1HD7 Kyowariken K-359S1 Chitose Institute of Science and Technology
Self Assembled Structure Manufacturing Self Assembled Structure Manufacturing U.S.I Corp. ESD-23 Remodeled Movement speed : 0.1 – 99.9mm/min Chitose Institute of Science and Technology
Rubbing Systems Rubbing Systems Nippon Bunkaseiko Co., Ltd. Chitose Institute of Science and Technology
Plasma Etcher Plasma Etcher SAMCO FA-1 Chitose Institute of Science and Technology
Plasma processing apparatus Plasma Cleaner Yamato Scientific PDC-200 Plasma mode RIE Electrode structure Parallel plate High-frequency output 100 – 300W Oscillating frequency 13.56MHz NIMS
Cross-section specimen preparation apparatus for electron microscope Precision Ion Polishing System GATAN.Inc. MODEL 619 PIPS Japan Advanced Institute of Science and Technology
Focused ion beam (FIB) Focused ion beam sytem (FIB) SII Nano Technology SMI3050 Japan Advanced Institute of Science and Technology
Focused ion beam (FIB) JEOL JEM-9310FIB Capable of processing specimens for SEM and TEM in the range of 1 inch Institute for Molecular Science
Spray Dryer Spray Dryer Buchi B-290 Heater: 2300W, Spray gas: Compressed air or nitrogen 200-1000L/h、5-8 bar Maximum airflow: 35m3/h Flow rate: 1.0L/h NIMS
Freeze dryer Freeze dryer Vertis Freezemobile NIMS
Molecule and material synthesis support Molecule and material synthesis support Design, prototyping and evaluation of physical system nanomaterials Japan Advanced Institute of Science and Technology
Nano Carbon Manufacturing Catalytic CVD apparatus Shinshu University
Plasma surface treatment apparatus Shinshu University
Nanofiber synthesis device Shinshu University
Nano Composite Manufacturing Biaxial extrudeing kneading machine Screw diameter : 15mm Shaft length to shaft diameter ratio(L/D) : 60 Maximum melting temperature: about 450 °C Maximum kneading rate: 1kg/h Shinshu University
Laboplastomill Maximum temperature: 400°C Kneading unit volume: 60cc (Maximum amount of material input 50cc) Maximum torque : 500N・m etc. Shinshu University
High performance diamond electrode forming and analyzing system Cornes Technologies High Power Microwave Plasma CVD Systems Microscopic Laser Raman spectrophotometer TOYO Corp. Resistivity / Hall measurement system  Precision compact specimen polisher Shinshu University
Furnace Infrared heating single crystal Growth FZ furnace NEC (now Canon Machinery) SC-M50XS Maximum heating temperature : 2700 °C Chitose Institute of Science and Technology
Electric furnace ADVANTEC FUH632DA NIMS
High-temperature heat treatment equipment (ceramic electric tubular furnace) Seinan Industries ARF-30K Vacuum degree : up to 10-5Pa Temperature : up to 1000 °C Osaka University
Plasma-gas-condensation cluster deposition apparatus Plasma-gas-condensation cluster deposition apparatus Vieetech Japan Special specification Cluster size 3 – 15nm in diameter DC magnetron sputtering method Nagoya Institute of Technology
Medium-sized carbon nano fiber room temperature synthesis device Medium-sized carbon nano fiber room temperature synthesis device: self-made Nagoya Institute of Technology
Special specification surface nanostructure forming apparatus ULVAC Special specification Normal 2 inches substrate, Capable of forming surface nanostructure/nanodot without masking by super oblique incidence ion beam, capable of composition control, capable of processing polymer materials Nagoya Institute of Technology
Graphene and carbon nanotube synthesis apparatus Original special specification apparatus Graphene and carbon nanotube synthesis by CVD Nagoya Institute of Technology
Ultra-fine smoothing equipment for electronic substrate MAT Substrate less than 2 inches in diameter, Able to adjust up to 8 inches upon your request.(negotiable) For forming small diameter, plane direction control is possible at 0.1 degree. Nagoya Institute of Technology
Reactive ion etcher Reactive ion etcher SAMCO RIE-10NR Sample size : max 8inch Gas species : Ar,CF4, O2 Osaka University