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Thin Film / Nano Structure Preparation and Processing

Spin coater Spin coater
Mikasa 1HD7
Kyowariken K-359S1
Chitose Institute of Science and Technology
Self Assembled Structure Manufacturing Self Assembled Structure Manufacturing
U.S.I Corp. ESD-23 Remodeled
Movement speed : 0.1 – 99.9mm/min Chitose Institute of Science and Technology
Plasma processing apparatus Plasma Cleaner Yamato Scientific
PDC-200
Plasma mode RIE
Electrode structure Parallel plate
High-frequency output 100 – 300W
Oscillating frequency 13.56MHz
NIMS
Cross-section specimen preparation apparatus for electron microscope Precision Ion Polishing System
GATAN.Inc. MODEL 619 PIPS
Japan Advanced Institute of Science and Technology
Focused ion beam (FIB) Focused ion beam sytem (FIB)
SII Nano Technology SMI3050
Japan Advanced Institute of Science and Technology
Focused ion beam (FIB)
JEOL JEM-9310FIB
Capable of processing specimens for SEM and TEM in the range of 1 inch Institute for Molecular Science
Spray Dryer Spray Dryer
Buchi B-290
Heater: 2300W,
Spray gas: Compressed air or nitrogen 200-1000L/h、5-8 bar
Maximum airflow: 35m3/h
Flow rate: 1.0L/h
NIMS
Freeze dryer Freeze dryer
Vertis Freezemobile
NIMS
Molecule and material synthesis support Molecule and material synthesis support Design, prototyping and evaluation of physical system nanomaterials Japan Advanced Institute of Science and Technology
Nano Carbon Manufacturing Catalytic CVD apparatus Shinshu University
Plasma surface treatment apparatus Shinshu University
Nanofiber synthesis device Shinshu University
Nano Composite Manufacturing Biaxial extrudeing kneading machine Screw diameter : 15mm
Shaft length to shaft diameter ratio(L/D) : 60
Maximum melting temperature: about 450 °C
Maximum kneading rate: 1kg/h
Shinshu University
Laboplastomill Maximum temperature: 400°C
Kneading unit volume: 60cc (Maximum amount of material input 50cc)
Maximum torque : 500N・m etc.
Shinshu University
High performance diamond electrode forming and analyzing system Cornes Technologies High Power Microwave Plasma CVD Systems
Microscopic Laser Raman spectrophotometer
TOYO Corp. Resistivity / Hall measurement system 
Precision compact specimen polisher
Shinshu University
Furnace Infrared heating single crystal Growth FZ furnace
NEC (now Canon Machinery) SC-M50XS
Maximum heating temperature : 2700 °C Chitose Institute of Science and Technology
Electric furnace
ADVANTEC FUH632DA
NIMS
High-temperature heat treatment equipment (ceramic electric tubular furnace)
Seinan Industries ARF-30K
Vacuum degree : up to 10-5Pa
Temperature : up to 1000 °C
Osaka University
Plasma-gas-condensation cluster deposition apparatus Plasma-gas-condensation cluster deposition apparatus
Vieetech Japan Special specification
Cluster size 3 – 15nm in diameter
DC magnetron sputtering method
Nagoya Institute of Technology
Medium-sized carbon nano fiber room temperature synthesis device Medium-sized carbon nano fiber room temperature synthesis device: self-made Nagoya Institute of Technology
Special specification surface nanostructure forming apparatus ULVAC Special specification Normal 2 inches substrate,
Capable of forming surface nanostructure/nanodot without masking by super oblique incidence ion beam, capable of composition control, capable of processing polymer materials
Nagoya Institute of Technology
Graphene and carbon nanotube synthesis apparatus Original special specification apparatus Graphene and carbon nanotube synthesis by CVD Nagoya Institute of Technology
Ultra-fine smoothing equipment for electronic substrate MAT Substrate less than 2 inches in diameter, Able to adjust up to 8 inches upon your request.(negotiable)
For forming small diameter, plane direction control is possible at 0.1 degree.
Nagoya Institute of Technology
Reactive ion etcher Reactive ion etcher
SAMCO RIE-10NR
Sample size : max 8inch
Gas species : Ar,CF4, O2
Osaka University