Spin coater |
Spin coater Mikasa 1HD7 Kyowariken K-359S1 |
|
Chitose Institute of Science and Technology |
Self Assembled Structure Manufacturing |
Self Assembled Structure Manufacturing U.S.I Corp. ESD-23 Remodeled |
Movement speed : 0.1 – 99.9mm/min |
Chitose Institute of Science and Technology |
Rubbing Systems |
Rubbing Systems Nippon Bunkaseiko Co., Ltd. |
|
Chitose Institute of Science and Technology |
Plasma Etcher |
Plasma Etcher SAMCO FA-1 |
| Chitose Institute of Science and Technology |
Plasma processing apparatus |
Plasma Cleaner Yamato Scientific PDC-200 |
Plasma mode RIE Electrode structure Parallel plate High-frequency output 100 – 300W Oscillating frequency 13.56MHz |
NIMS |
Cross-section specimen preparation apparatus for electron microscope |
Precision Ion Polishing System GATAN.Inc. MODEL 619 PIPS |
|
Japan Advanced Institute of Science and Technology |
Focused ion beam (FIB) |
Focused ion beam sytem (FIB) SII Nano Technology SMI3050 |
|
Japan Advanced Institute of Science and Technology |
Focused ion beam (FIB) JEOL JEM-9310FIB |
Capable of processing specimens for SEM and TEM in the range of 1 inch |
Institute for Molecular Science |
Spray Dryer |
Spray Dryer Buchi B-290 |
Heater: 2300W, Spray gas: Compressed air or nitrogen 200-1000L/h、5-8 bar Maximum airflow: 35m3/h Flow rate: 1.0L/h |
NIMS |
Freeze dryer |
Freeze dryer Vertis Freezemobile |
|
NIMS |
Molecule and material synthesis support |
Molecule and material synthesis support |
Design, prototyping and evaluation of physical system nanomaterials |
Japan Advanced Institute of Science and Technology |
Nano Carbon Manufacturing |
Catalytic CVD apparatus |
|
Shinshu University |
Plasma surface treatment apparatus |
|
Shinshu University |
Nanofiber synthesis device |
|
Shinshu University |
Nano Composite Manufacturing |
Biaxial extrudeing kneading machine |
Screw diameter : 15mm Shaft length to shaft diameter ratio(L/D) : 60 Maximum melting temperature: about 450 °C Maximum kneading rate: 1kg/h |
Shinshu University |
Laboplastomill |
Maximum temperature: 400°C Kneading unit volume: 60cc (Maximum amount of material input 50cc) Maximum torque : 500N・m etc. |
Shinshu University |
High performance diamond electrode forming and analyzing system |
|
Cornes Technologies High Power Microwave Plasma CVD Systems Microscopic Laser Raman spectrophotometer TOYO Corp. Resistivity / Hall measurement system Precision compact specimen polisher |
Shinshu University |
Furnace |
Infrared heating single crystal Growth FZ furnace NEC (now Canon Machinery) SC-M50XS |
Maximum heating temperature : 2700 °C |
Chitose Institute of Science and Technology |
Electric furnace ADVANTEC FUH632DA |
|
NIMS |
High-temperature heat treatment equipment (ceramic electric tubular furnace) Seinan Industries ARF-30K |
Vacuum degree : up to 10-5Pa Temperature : up to 1000 °C |
Osaka University |
Plasma-gas-condensation cluster deposition apparatus |
Plasma-gas-condensation cluster deposition apparatus Vieetech Japan Special specification |
Cluster size 3 – 15nm in diameter DC magnetron sputtering method |
Nagoya Institute of Technology |
Medium-sized carbon nano fiber room temperature synthesis device |
Medium-sized carbon nano fiber room temperature synthesis device: self-made |
|
Nagoya Institute of Technology |
Special specification surface nanostructure forming apparatus |
ULVAC Special specification |
Normal 2 inches substrate, Capable of forming surface nanostructure/nanodot without masking by super oblique incidence ion beam, capable of composition control, capable of processing polymer materials |
Nagoya Institute of Technology |
Graphene and carbon nanotube synthesis apparatus |
Original special specification apparatus |
Graphene and carbon nanotube synthesis by CVD |
Nagoya Institute of Technology |
Ultra-fine smoothing equipment for electronic substrate |
MAT |
Substrate less than 2 inches in diameter, Able to adjust up to 8 inches upon your request.(negotiable) For forming small diameter, plane direction control is possible at 0.1 degree. |
Nagoya Institute of Technology |
Reactive ion etcher |
Reactive ion etcher SAMCO RIE-10NR |
Sample size : max 8inch Gas species : Ar,CF4, O2 |
Osaka University |