Toggle navigation
Home
M&MS Platform
Proposal
Download
Equipment
User Voice
User Reports
Seminar
English
日本語
利用報告書
(日本語) 低抵抗グラフェン配線の開発
T. Ishikura
Toshiba corporation
Sorry, this entry is only available in
Japanese
.
«
Fabrication of ferroelectric memory cell structure for high density device integration
Measurement of ferromagnetic resonance using coplanar waveguide
»
(日本語) 低抵抗グラフェン配線の開発
Institutes
Chitose Institute of Science and Technology
Tohoku University
National Institute for Materials Science
Shinshu University
Institute for Molecular Science
Nagoya University
Nagoya Institute of Technology
Japan Advanced Institute of Science and Technology
Nara Institute of Science and Technology
Osaka University
Kyushu University
Nanotech Japan
Microstructural Characterization Platform
Nanofabrication Platform