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(日本語) 分子ナノカーボン材料の開発と水素終端化シリコン基板上への自己組織化単分子膜の作製
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Theoretical Calculation of ESIPT Dye with Restricted Molecular Motion
Deposition of diamond-like carbon film by chemical solution process
»
(日本語) 分子ナノカーボン材料の開発と水素終端化シリコン基板上への自己組織化単分子膜の作製
Institutes
Chitose Institute of Science and Technology
Tohoku University
National Institute for Materials Science
Shinshu University
Institute for Molecular Science
Nagoya University
Nagoya Institute of Technology
Japan Advanced Institute of Science and Technology
Nara Institute of Science and Technology
Osaka University
Kyushu University
Nanotech Japan
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