利用報告書
Establishment of control technique for the number of thermal CVD graphene film layers by process gas control.
Establishment of control technique for the number of thermal CVD graphene film layers by process gas control.
Institutes
- Chitose Institute of Science and Technology
- Tohoku University
- National Institute for Materials Science
- Shinshu University
- Institute for Molecular Science
- Nagoya University
- Nagoya Institute of Technology
- Japan Advanced Institute of Science and Technology
- Nara Institute of Science and Technology
- Osaka University
- Kyushu University
- Nanotech Japan
- Microstructural Characterization Platform
- Nanofabrication Platform
Molecule and Material Synthesis Platform
National Institutes of Natural Sciences Institute for Molecular Science
38 Nishigo-Naka,Myodaiji, Okazaki 444-8585, Japan
TEL +81-564-55-7447