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Development of DNA Sensing Device by Self-assembled Nanopore
K. Kawai、S.Ishimaru、Y. Okada、M. Morita、T. Hayashi
1) Graduate school of Eng., Osaka Univ.
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Japanese
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Study of flat etching technique in Si substrate
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Development of DNA Sensing Device by Self-assembled Nanopore
Institutes
Chitose Institute of Science and Technology
Tohoku University
National Institute for Materials Science
Shinshu University
Institute for Molecular Science
Nagoya University
Nagoya Institute of Technology
Japan Advanced Institute of Science and Technology
Nara Institute of Science and Technology
Osaka University
Kyushu University
Nanotech Japan
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