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Technology development of high density arranging for the substrate in CVD chamber.
Y. Fujiwara
1)
, Y.Wakasugi
2)
1), 2) KYOCERA Coporation
Sorry, this entry is only available in
Japanese
.
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Technology development of high density arranging for the substrate in CVD chamber.
Institutes
Chitose Institute of Science and Technology
Tohoku University
National Institute for Materials Science
Shinshu University
Institute for Molecular Science
Nagoya University
Nagoya Institute of Technology
Japan Advanced Institute of Science and Technology
Nara Institute of Science and Technology
Osaka University
Kyushu University
Nanotech Japan
Microstructural Characterization Platform
Nanofabrication Platform